Epitaxial Equipment : MBE Components
MBE Substrate Heaters
Veeco substrate heaters deliver excellent thermal uniformity in molecular beam epitaxy (MBE) systems because of their PBN diffuser plate and a sophisticated filament design. The densely wound tungsten wire filament provides a large surface area and cross-sectional uniformity that prevents hot spot formation. This enhances system reliability and wafer reproducibility. Heat shielding projects thermal energy toward the substrate, which reduces power/current consumption as much as 50%. This reduces background pressure and gives a clearer RHEED pattern. The substrate heater's efficient operation minimizes outgassing during growth. Only tantalum, tungsten and PBN are used in the hot zone of the heater.
Most recent, it is now possible to utilize Veeco's innovative and proven substrate heaters in high oxygen and ammonia partial pressure environments, utilizing special corrosive resistant manufacturing materials. With the recent surge in oxide material research, Veeco's oxygen resistant substrate heaters are available for temperatures up to 1150°C and partial pressures of 5 milliTorr. Likewise, due to the increasing interest in using ammonia (NH3) as the nitrogen source, Veeco's ammonia compatible substrate heaters are available for temperatures up to 1350°C and partial pressures of 1x10-4 Torr. By extending the experimental temperature and pressure range, increased campaign times and minimized repair costs can be incurred.
Data Sheets