Metrology & Instrumentation
Process Equipment
Epitaxial Equipment
Solutions for a nanoscale world.™

Epitaxial Equipment : MBE Sources

Medium Temperature

Ammonia Resistant Sources  
Ammonia Resistant Sources   
These extended life sources for ammonia environments allow operation at higher temperatures and partial pressures enabling increased campaign time and minimized repair costs.
 
Cold Lip SUMO Source for Aluminum  
Cold Lip SUMO Source for Aluminum   
This patented source designed specifically for aluminum evaporation eliminates damage from material creep while providing good thickness uniformity and flux stability.
 
Downward-Looking SUMO Source for Gallium and Indium  
Downward-Looking SUMO Source for Gallium and Indium   
This source is designed as a Dual Filament Source with an asymmetric SUMO crucible that can accommodate a molten charge in a downward-facing source port, offering increased charge capacity with excellent flux stability and uniformity.
 
Dual Filament Source  
Dual Filament Source   
This source uses two independent heaters, dual filaments, to prevent condensation at the crucible orifice, producing a more hydrodynamically stable flux and a reduction in morphological defects.
 
Hot Lip SUMO Source for Gallium and Indium  
Hot Lip SUMO Source for Gallium and Indium   
This patented source is designed to eliminate material recondensation at the crucible orifice to reduce oval defects while offering excellent flux stability and uniformity along with an increased charge capacity.
 
Oxygen Resistant Sources  
Oxygen Resistant Sources   
These extended life sources for oxygen environments allow operation at higher temperatures and partial pressures enabling increased campaign time and minimized repair costs.
 
Single Filament Sources  
Single Filament Sources   
This source is a cost-effective solution that offers good performance for general purpose applications utilizing a band-style thermocouple to increase thermal stability and provide better accuracy.