Process Equipment : Ion Beam Etch

The NEXUS® IBE-420Si Ion Beam Etching System offers unsurpassed uniformity over a wide range of energy and process angles, making it ideal for etch depth control of next-generation ABS step and cavity processing. The new NEXUS 420 Ion Source provides excellent uniformity and repeatability to help maximize slider yields. The improved NEXUS platform offers better CoO toolsets, faster time to market for new applications, better asset utilization and faster install time. For those who have process qualified the RF-350 ion source, this system is also available with a RF-350 ion source that can be field upgraded to a NEXUS 420 ion source.