Process Equipment : Physical Vapor Deposition

Veeco's single-target NEXUS PVDi Physical Vapor Deposition System offers maximum flexibility for a wide range of applications with exceptional uniformity and repeatability.  Featuring advanced process capabilities with multiple deposition modes, the PVDi provides high throughput, high uptime and a small footprint for a lower cost of ownership.  As part of the NEXUS family, it can be integrated on a common hardware and software platform with complementary technologies, such as ion beam deposition, ion beam etch and atomic layer deposition.